Features
• Extended ISO Class I cleanliness (using the optimized default settings and without air-assist)
• Compatible with all wafer technology nodes, including 22 nm and below
• Modulated pulse technology • Precision balance, high ion output with long-term stability
• Excellent lateral uniformity • Uniform balance across the AeroBar
• Low field voltages • Safe placement as close as 150 mm of the wafer or reticle
• Air-assist capability • Enhanced static charge neutralization at fast automation speeds
• Quarter-turn nozzles • Fast emitter point replacement for less downtime
• Optional software with easy-to-use interface with wide adjustability
• Fast setup and easy optimization in any environment
• Alarm output signal • Communicate to tool or facility monitoring system